The EBARA ESR20N Vacuum Pump is an ESR (Energy Saving Roots) multistage dry vacuum pump. Its operating system and LCD touch panel allow for intuitive handling and it can cut through a range of materials, including difficult-to-cut materials essential to the nanofabrication process such as silicon. The Disco DAD3240 Dicing Saw is a compact, manual, precision dicing saw with an automatic function which is common to the DAD3000 series. The Despatch LCC1 Resist Oven are used in die-curing and other semiconductor packing processes. It is used for nanoscale surface topography, nano-mechanical, nano-electircal, and nano-scale chemical mapping, and morphology measurement. The Bruker Dimension Icon AFM (Atomic Force Microscope) is a very high resolution scanning microscope used in scanning microscopy (SPM) which produces three dimensional images. These high intensity systems can resolve fine structures even in thick resist. The optical integrator system produces non-coherent radiation that virtually eliminates the detrimental effects of diffraction.
The system’s exposure optics employ a proven, high performance optic train that employs an elliptical reflector, dielectric heat removing primary and secondary mirrors, a multi-element optical integrator system and collimating optics.
Bachur and Associates UV Flood Exposure System The NexDep can be configured for a variety of PVD processes including resistive thermal evaporation, sputter and ion assisted deposition, and principal E-Beam and Thermal evaporation capacities. The Angstrom Nexdep Thermal E-Beam Evaporator is a PVD tool that offers E-Beam and Thermal evaporation for a variety of high melting point substrates. Angstrom Nexdep Thermal E-Beam Evaporator The EvoVac provides multiple sources of flexibility in its deposition system including resistive thermal evaporation, ion assisted and sputter deposition, as well as principal electron beam evaporation. The Angstrom EvoVac Electron Beam Evaporator is a PVD tool which evaporates high melting point materials, such as refractory metals and ceramics, using an electron beam. Magnetron sputtering uses accelerated, positively charged ions from a plasma source to deposit films with an increased deposition rate and more controlled election bombardment than evident in other sputtering systems (such as diode sputtering). The AJA ATC Orion 8 UVH Sputtering System is a PVD tool which deposits films on a substrate using magnetron sputtering. Magnetron sputtering uses accelerated, positively charged ions from a plasma source to deposit films with an increased deposition rate and more controlled electron bombardment than evident in other sputtering systems (such as diode sputtering). The AJA ATC 2200 Sputtering System is a PVD tool which deposits films on a substrate by a method known as sputtering. It is capable of submicron resolution and high accuracy alignment. The GCA AutoStep 200 Stepper is an I-line 5x reduction stepper with repeat exposure capabilities. 3C Technical GCA AutoStep 200 5x Reduction Stepper
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